@Article{TanUedaDallRoss:2006:MaFiEf,
               author = "Tan, Ing Hwie and Ueda, M{\'a}rio and Dallaqua, Renato 
                         S{\'e}rgio and Rossi, Jos{\'e} Oswaldo",
          affiliation = "Instituto nacional de Pesquisas Espaciais, Laborat{\'o}rio 
                         Associado de Plasma (INPE.LAP) and Instituto nacional de Pesquisas 
                         Espaciais, Laborat{\'o}rio Associado de Plasma (INPE.LAP) and 
                         Instituto nacional de Pesquisas Espaciais, Laborat{\'o}rio 
                         Associado de Plasma (INPE.LAP) and Instituto nacional de Pesquisas 
                         Espaciais, Laborat{\'o}rio Associado de Plasma (INPE.LAP)",
                title = "Magnetic field effects on secondary electrons emitted during ion 
                         implantation in vacuum arc plasmas",
              journal = "Nuclear Instruments and Methods in Physics Research Section B: 
                         Beam Interactions with Materials and Atoms",
                 year = "2006",
               volume = "242",
               number = "1/2",
                pages = "332--334",
                month = "Jan",
             keywords = "plasma immersion ion implantation, secondary electrons, magnetic 
                         suppression, BOMBARDMENT.",
             abstract = "Aluminum ions produced in a vacuum arc system with a straight 
                         magnetic duct were implanted in a copper sample oriented with its 
                         surface parallel to the plasma stream and magnetic field. One 
                         Faraday cup measured the secondary electrons emitted normally to 
                         the sample's surface, while another cup was oriented to detect 
                         electrons that flow along the field lines. Large negative spikes 
                         coincident with high voltage pulses are seen in the perpendicular 
                         cup's current when the field is absent. These spikes correspond to 
                         emitted secondary electrons as shown by their energies, measured 
                         by operating the cup as a retarding potential analyzer. A 
                         secondary electron emission coefficient of 0.53 was measured at 
                         -2.5 kV. When a 12.5 mT magnetic field is applied, these spikes 
                         are not seen, neither in the perpendicular cup's current, showing 
                         that secondary electrons were magnetically suppressed, nor in the 
                         longitudinal cup's current, indicating that a virtual cathode was 
                         formed near the electrode's surface.",
           copyholder = "SID/SCD",
                 issn = "0168-583X and 0167-5087",
             language = "en",
           targetfile = "Magnetic field effects on secondary electrons.pdf",
        urlaccessdate = "18 maio 2024"
}